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Establishing a thermal atomic layer deposition process for AlGaN

Steenge, Céline (2022) Establishing a thermal atomic layer deposition process for AlGaN.

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Full Text Status:Access to this publication is restricted
Embargo date:26 August 2029
Item Type:Essay (Master)
Faculty:EEMCS: Electrical Engineering, Mathematics and Computer Science
Subject:33 physics, 35 chemistry, 51 materials science, 53 electrotechnology
Programme:Electrical Engineering MSc (60353)
Link to this item:https://purl.utwente.nl/essays/91687
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